Deskripsi Pekerjaan
Join Singapore's premier research organization as a Research Engineer specializing in Plasma-Enhanced Chemical Vapor Deposition (PECVD) processes. This pivotal role at the Institute of Microelectronics (IME) offers the opportunity to drive innovation in semiconductor manufacturing by optimizing PECVD process modules for enhanced quality and yield. You'll work at the forefront of materials science, collaborating with cross-functional teams to develop next-generation deposition techniques that push the boundaries of nanotechnology.
The position demands a hands-on approach to process optimization, requiring deep technical expertise in plasma physics, thin-film deposition, and semiconductor fabrication. You'll be instrumental in translating theoretical concepts into practical solutions, supporting clients across Asia's advanced electronics ecosystem. The ideal candidate combines rigorous analytical skills with creative problem-solving abilities to address complex process challenges in a dynamic R&D environment.
Tanggung Jawab
- Design, develop, and optimize PECVD process parameters for semiconductor applications
- Conduct rigorous process characterization and yield analysis for process modules
- Collaborate with materials scientists and process engineers to implement advanced deposition techniques
- Document and troubleshoot process deviations using statistical process control methods
- Lead cross-functional projects to transfer process technologies from lab to fab
- Stay current with industry advancements in plasma deposition technologies
Kualifikasi
- MSc/PhD in Chemical Engineering, Materials Science, or related technical field
- Minimum 3 years of hands-on PECVD process development experience
- Expertise in semiconductor thin-film deposition and plasma diagnostics
- Proficiency in experimental design and DOE methodologies
- Strong analytical skills with experience in process data interpretation
- Demonstrated ability to work in multidisciplinary R&D teams